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Technical Journal No.1 (December 1997)
Special Papers
Low Temperature Polysilicon Technology for Advanced Display Systems

Tolis Voutsas

In this paper I review research and development in the area of low temperature polysilicon (p-Si) formation for application in advanced display systems. A brief introduction to the scope of these efforts and the market for this technology is given, followed by a presentation of the methods that are being developed to meet these objectives. The technical merits and demerits of various approaches for low-temperature p-Si formation are reviewed on the basis of current studies, and an attempt is made to extrapolate trends and suggest solutions for the technical difficulties that currently plague the development of a manufacturing-compatible process.

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