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Technical Journal No.2 (August 1999)
Special Papers
The Development of the New Low Resistive MaterialBus-Line Process with Super High Aperture Ratio for High Resolution TFT-LCDs

Yoshitaka HibinoTetsuya TaruiToshihiko HirobeTolis Voutsas

The TFT-alley process for high resolution and large screen size TFT-LCD such as 20UXGA (1600x1200) is developed without the need for extra processing steps. A demonstrated novel process uses Pure-Al metal as gate and source electrode with low dielectric interlayer, which can result in achieving high performance a-Si TFT with high yield. 18.1SXGA(1280x1024) panel was already introduced in the mass production and achieved high cost performance with high aperture ratio.

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