In the field of device production of such as
semiconductor, SPM (mixture of sulfuric
acid and hydrogen peroxide) has been
mainly used for removing organic
contaminants including photoresist.
However, recently there have been a keen
requirement of cleaning with little
environmental load for global environmental
SHARP has developed an innovative
cleaning system that employs high
temperature and high concentration
ozonated water generator; Concentration:
150mg/L at 70℃ (standard guaranteed)
The ozonated water generated shows dark
ozone blue reflecting its high concentration.